Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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[[Image:AZ spectral sensitivity.gif|400x400px|thumb|Spectral sensitivity of AZ resists represented as optical absorption. From https://www.lithoprotect.com/en/worth-knowing/]] | [[Image:AZ spectral sensitivity.gif|400x400px|thumb|Spectral sensitivity of AZ resists represented as optical absorption. From https://www.lithoprotect.com/en/worth-knowing/]] | ||
'''Data represent dose-defocus tests on Si using optical autofocus unless otherwise stated''' | |||
{|border="1" cellspacing="1" cellpadding="7" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
| | |||
!Thickness | |||
!Laser | |||
!Exposure mode | |||
!Dose | |||
!Defoc | |||
!Resolution | |||
!Comments | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!rowspan="2"| AZ 5206E <sup>1)</sup> | |||
|rowspan="2"| 0.5 µm | |||
|rowspan="2"| 375 nm | |||
| Fast | |||
| 60 mJ/cm<sup>2</sup> | |||
| -6 | |||
| 1 µm (not optimized) | |||
| Dev: 2xSP30s | |||
|-style="background:WhiteSmoke; color:black" | |||
| Quality | |||
| 60 mJ/cm<sup>2</sup> | |||
| -6 | |||
| ~750 nm (not optimized) | |||
| Dev: 2xSP30s | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
!rowspan="3"| AZ 5214E | |||
|rowspan="3"| 1.5 µm | |||
| 405 nm | |||
| Fast | |||
| 90 mJ/cm<sup>2</sup> | |||
| -2 | |||
| 1-2 µm | |||
| Dev: SP60s | |||
|-style="background:LightGrey; color:black" | |||
|rowspan="2"| 375 nm | |||
| Fast | |||
| 65 mJ/cm<sup>2</sup> | |||
| 2 | |||
| ~1 µm | |||
| Dev: SP60s | |||
|-style="background:LightGrey; color:black" | |||
| Quality | |||
| 65 mJ/cm<sup>2</sup> | |||
| 2 | |||
| ~750 nm | |||
| Dev: SP60s | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!rowspan="3"| AZ MiR 701 | |||
|rowspan="3"| 1.5 µm | |||
| 405 nm | |||
| Fast | |||
| 200 mJ/cm<sup>2</sup> | |||
| -5 | |||
| ~1 µm (not optimized) | |||
| PEB: 60s@110°C, Dev: SP60s | |||
|-style="background:WhiteSmoke; color:black" | |||
|rowspan="2"| 375 nm | |||
| Fast | |||
| 170 mJ/cm<sup>2</sup> | |||
| -5 | |||
| 1 µm | |||
| PEB: 60s@110°C, Dev: SP60s | |||
|-style="background:WhiteSmoke; color:black" | |||
| Quality | |||
| 180 mJ/cm<sup>2</sup> | |||
| -6 (Feb 2019) <br> -2 (Apr 2019) | |||
| <750 nm | |||
| PEB: 60s@110°C, Dev: SP60s <br> Large structures probably over-exposed | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
!rowspan="2"| AZ nLOF 2020 | |||
|rowspan="2"| 2 µm | |||
|rowspan="2"| 375 nm | |||
| Fast | |||
| 400 mJ/cm<sup>2</sup> | |||
| 5 | |||
| ~1 µm (not optimized) | |||
| PEB: 60s@110°C, Dev: SP60s <br> Probably under-exposed | |||
|-style="background:LightGrey; color:black" | |||
| Quality | |||
| 400 mJ/cm<sup>2</sup> | |||
| 0 | |||
| 1 µm | |||
| PEB: 60s@110°C, Dev: SP60s <br> Probably under-exposed | |||
|- | |||
|} | |||
<sup>1)</sup> AZ5214E diluted with PGMEA 1:1 per volume. | |||