Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
| Line 74: | Line 74: | ||
|DIW | |DIW | ||
|BOE | |BOE | ||
| a = ?, b = ? | |||
|150C, 10 min | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
|'''AR-N 7520''' | |||
|Negative | |||
|[https://www.allresist.com/wp-content/uploads/sites/2/2022/03/Allresist_Product-information-E-Beamresist-AR-N-7520new-English-web.pdf AR-N 7520 info] | |||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]] | |||
|AR 300-12 | |||
|AR 300-47 | |||
|? | |||
|AR 300-73 | |||
| a = ?, b = ? | | a = ?, b = ? | ||
|150C, 10 min | |150C, 10 min | ||