Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
| Line 45: | Line 45: | ||
|'''Thinner''' | |'''Thinner''' | ||
|'''Developer''' | |'''Developer''' | ||
|''' | |'''Stopper''' | ||
|'''Remover''' | |'''Remover''' | ||
|'''Polynomial''' | |'''Polynomial''' | ||
| Line 57: | Line 57: | ||
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P6200_CSAR62english_Allresist_product-information.pdf CSAR 62 info] | |[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P6200_CSAR62english_Allresist_product-information.pdf CSAR 62 info] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]] | ||
|AR 600-02/Anisole | |AR 600-02 / Anisole | ||
|AR | |AR 600-546 | ||
|IPA | |AR 600-60 / IPA | ||
|1165 Remover | |AR 600-71 / 1165 Remover | ||
| a = 7252.2, b = -0.454 | | a = 7252.2, b = -0.454 | ||
|180C, 3-10 min | |180C, 3-10 min | ||