Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
| Line 75: | Line 75: | ||
|AR 300-47 | |AR 300-47 | ||
|DIW | |DIW | ||
| | |||
| a = ?, b = ? | |||
|150C, 10 min | |150C, 10 min | ||
|} | |} | ||
| Line 75: | Line 75: | ||
|AR 300-47 | |AR 300-47 | ||
|DIW | |DIW | ||
| | |||
| a = ?, b = ? | |||
|150C, 10 min | |150C, 10 min | ||
|} | |} | ||