Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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=Resist coating= | =Resist coating= | ||
DTU Nanolab offers a few different standard resist as given in the table below. Typically layers of 50-500 nm are applied. The Gamma UV & E-beam coater has predefined recipes for various thickness of CSAR resist. For other thickness or other resist the more manual Lab Spin 2 or 3 coasters can be used. If using the Lab Spin coaters please refer to the table below for information on thickness versus spin speed and soft bake | DTU Nanolab offers a few different standard resist as given in the table below. Typically layers of 50-500 nm are applied. The Gamma UV & E-beam coater has predefined recipes for various thickness of CSAR resist. For other thickness or other resist the more manual Lab Spin 2 or 3 coasters can be used. If using the Lab Spin coaters please refer to the table below for information on thickness versus spin speed and soft bake conditions. | ||
Table with: Resist, polarity, process guideline link, spin speed, baking info, developing agent, removing agent | Table with: Resist, polarity, process guideline link, spin speed, baking info, developing agent, removing agent | ||