Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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|'''Rinse''' | |'''Rinse''' | ||
|'''Remover''' | |'''Remover''' | ||
|'''Polynomial''' | |||
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|IPA | |IPA | ||
|AR-600-71, 1165 Remover | |AR-600-71, 1165 Remover | ||
| a = 7252.2, b = -0.454 | |||
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Resist thickness as function of spin speed on Lab Spin 2/3 can be estimated from the parameters above as y = ax^b, where y is resist thickness in nm and x is spin speed in RPM. | |||
Discharge layer application | Discharge layer application | ||