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Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 43: Line 43:
|'''Resist'''
|'''Resist'''
|'''Polarity'''
|'''Polarity'''
|'''Technical reports'''
|'''Process guidelines'''
|'''Spin Coater'''
|'''Spin Coater'''
|'''Thinner'''
|'''Thinner'''
Line 54: Line 54:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]'''
|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR 62 / AR-P 6200.09]]'''
|Positive
|Positive
|[[media:Allresist_CSAR62_English.pdf‎|Allresist CSAR62 info sheet‎]]
|[[media:Allresist_CSAR62_English.pdf‎|Allresist CSAR62 info sheet‎]]
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