Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

Thope (talk | contribs)
Thope (talk | contribs)
Line 43: Line 43:
|'''Resist'''
|'''Resist'''
|'''Polarity'''
|'''Polarity'''
|'''Comments'''
|'''Technical reports'''
|'''Technical reports'''
|'''Spin Coater'''
|'''Spin Coater'''
Line 57: Line 56:
|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]'''
|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]'''
|Positive
|Positive
|Standard positive resist, very similar to ZEP520.
|[[media:Allresist_CSAR62_English.pdf‎|Allresist CSAR62 info sheet‎]]
|[[media:Allresist_CSAR62_English.pdf‎|Allresist CSAR62 info sheet‎]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]]
Line 70: Line 68:
|Negative
|Negative
|[http://www.allresist.com AllResist]
|[http://www.allresist.com AllResist]
|Both e-beam and DUV sensitive resist. Currently being tested, contact [mailto:thope@dtu.dk Thomas Pedersen] for information.
|
|
|
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]]
|AR 300-47
|AR 300-47
|DIW
|DIW
Line 81: Line 78:
|'''AR-N 7520'''
|'''AR-N 7520'''
|Negative
|Negative
|Both e-beam, DUV and UV-sensitive resist. Currently being tested, contact [mailto:pxshi@dtu.dk Peixiong Shi] for information.
|[[media:AR-N7500-7520.pdf‎|AR-N7500-7520.pdf‎]]
|[[media:AR-N7500-7520.pdf‎|AR-N7500-7520.pdf‎]]
|See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u>
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]]
|PGMEA
|PGMEA
|AR 300-47
|AR 300-47