Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
Appearance
| Line 43: | Line 43: | ||
|'''Resist''' | |'''Resist''' | ||
|'''Polarity''' | |'''Polarity''' | ||
|'''Technical reports''' | |'''Technical reports''' | ||
|'''Spin Coater''' | |'''Spin Coater''' | ||
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|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]''' | |'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]''' | ||
|Positive | |Positive | ||
|[[media:Allresist_CSAR62_English.pdf|Allresist CSAR62 info sheet]] | |[[media:Allresist_CSAR62_English.pdf|Allresist CSAR62 info sheet]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]] | ||
| Line 70: | Line 68: | ||
|Negative | |Negative | ||
|[http://www.allresist.com AllResist] | |[http://www.allresist.com AllResist] | ||
| | | | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]] | |||
|AR 300-47 | |AR 300-47 | ||
|DIW | |DIW | ||
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|'''AR-N 7520''' | |'''AR-N 7520''' | ||
|Negative | |Negative | ||
|[[media:AR-N7500-7520.pdf|AR-N7500-7520.pdf]] | |[[media:AR-N7500-7520.pdf|AR-N7500-7520.pdf]] | ||
| | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]] | ||
|PGMEA | |PGMEA | ||
|AR 300-47 | |AR 300-47 | ||