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Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
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|Standard positive resist, very similar to ZEP520.
|Standard positive resist, very similar to ZEP520.
|[[media:Allresist_CSAR62_English.pdf‎|Allresist CSAR62 info sheet‎]]
|[[media:Allresist_CSAR62_English.pdf‎|Allresist CSAR62 info sheet‎]]
|Gamma UV & E-beam or Lab Spin 02/03
|*[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] or Lab Spin 02/03
|Anisole
|Anisole
|AR-600-546, AR-600-548, N50, MIBK:IPA
|AR-600-546, AR-600-548, N50, MIBK:IPA
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