Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
| Line 37: | Line 37: | ||
|Positive | |Positive | ||
|Standard positive resist, very similar to ZEP520. | |Standard positive resist, very similar to ZEP520. | ||
|[[media:Allresist_CSAR62_English.pdf|CSAR62 | |[[media:Allresist_CSAR62_English.pdf|CSAR62]] | ||
|See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u> | |See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u> | ||
|Anisole | |Anisole | ||