Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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|'''Resist''' | |'''Resist''' | ||
|'''Polarity''' | |'''Polarity''' | ||
|'''Comments''' | |'''Comments''' | ||
|'''Technical reports''' | |'''Technical reports''' | ||
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|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]''' | |'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]''' | ||
|Positive | |Positive | ||
|Standard positive resist, very similar to ZEP520. | |Standard positive resist, very similar to ZEP520. | ||
|[[media:Allresist_CSAR62_English.pdf|Allresist_CSAR62_English.pdf]],, [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | |[[media:Allresist_CSAR62_English.pdf|Allresist_CSAR62_English.pdf]],, [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | ||
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|'''[[Specific_Process_Knowledge/Lithography/ZEP520A|ZEP520A]]''' (not supplied by Nanolab anymore) | |'''[[Specific_Process_Knowledge/Lithography/ZEP520A|ZEP520A]]''' (not supplied by Nanolab anymore) | ||
|Positive resist, contact [mailto:Lithography@Nanolab.dtu.dk Lithography] if you plan to use this resist | |Positive resist, contact [mailto:Lithography@Nanolab.dtu.dk Lithography] if you plan to use this resist | ||
|Positive resist | |Positive resist | ||
|[[media:ZEP520A.pdf|ZEP520A.pdf]], [[media:ZEP520A.xls|ZEP520A spin curves on SSE Spinner]] | |[[media:ZEP520A.pdf|ZEP520A.pdf]], [[media:ZEP520A.xls|ZEP520A spin curves on SSE Spinner]] | ||
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|'''[[Specific_Process_Knowledge/Lithography/ARP617|Copolymer AR-P 617]]''' | |'''[[Specific_Process_Knowledge/Lithography/ARP617|Copolymer AR-P 617]]''' | ||
|Positive | |Positive | ||
|Approved, not tested yet. Used for trilayer (PE-free) resist-stack or double-layer lift-off resist stack. Please contact [mailto:Lithography@nanolab.dtu.dk Lithography] for information. | |Approved, not tested yet. Used for trilayer (PE-free) resist-stack or double-layer lift-off resist stack. Please contact [mailto:Lithography@nanolab.dtu.dk Lithography] for information. | ||
|[[media:AR_P617.pdf|AR_P617.pdf]] | |[[media:AR_P617.pdf|AR_P617.pdf]] | ||
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|'''[[Specific_Process_Knowledge/Lithography/mrEBL6000|mr EBL 6000.1]]''' | |'''[[Specific_Process_Knowledge/Lithography/mrEBL6000|mr EBL 6000.1]]''' | ||
|Negative | |Negative | ||
|Standard negative resist | |Standard negative resist | ||
|[[media:mrEBL6000 Processing Guidelines.pdf|mrEBL6000 processing Guidelines.pdf]] | |[[media:mrEBL6000 Processing Guidelines.pdf|mrEBL6000 processing Guidelines.pdf]] | ||
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|'''HSQ (XR-1541)''' | |'''HSQ (XR-1541)''' | ||
|Negative | |Negative | ||
|Approved. Standard negative resist | |Approved. Standard negative resist | ||
|[[media:DowCorningHSQA.pdf|HSQ Dow Corning]], [[media:MSDS HSQ.pdf|MSDS HSQ]] | |[[media:DowCorningHSQA.pdf|HSQ Dow Corning]], [[media:MSDS HSQ.pdf|MSDS HSQ]] | ||
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|'''AR-N 7520''' | |'''AR-N 7520''' | ||
|Negative | |Negative | ||
|Both e-beam, DUV and UV-sensitive resist. Currently being tested, contact [mailto:pxshi@dtu.dk Peixiong Shi] for information. | |Both e-beam, DUV and UV-sensitive resist. Currently being tested, contact [mailto:pxshi@dtu.dk Peixiong Shi] for information. | ||
|[[media:AR-N7500-7520.pdf|AR-N7500-7520.pdf]] | |[[media:AR-N7500-7520.pdf|AR-N7500-7520.pdf]] | ||
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|} | |} | ||