Specific Process Knowledge/Lithography/ARN8200: Difference between revisions
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|AR-N8200.06 | |AR-N8200.06 | ||
|LabSpin 2, 4000 rpm for 60s, softbake 10 min @ 150 degC | |LabSpin 2, 4000 rpm for 60s, softbake 10 min @ 150 degC, thickness is 105 nm | ||
|JBX9500, 60 nA, doses 100-1600 µC/cm2, 150 µm x 300 µm rectangles | |JBX9500, 60 nA, doses 100-1600 µC/cm2, 150 µm x 300 µm rectangles | ||
|Labspin 2 hotplate, 130, 150, 160 or 170 degC for 10 min | |Labspin 2 hotplate, 130, 150, 160 or 170 degC for 10 min | ||