Specific Process Knowledge/Lithography/ARN8200: Difference between revisions
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== Contrast curve == | == Contrast curve == | ||
Exposure dose | Exposure dose for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained by the following process parameters. | ||
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!colspan="5"|AR-N 8200 Contrast Curve, Processed by THOPE, FEB 2022 | |||
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|-style="background:WhiteSmoke; color:black" | |||
!Resist | |||
!Spin Coat | |||
!E-beam exposure | |||
!PEB | |||
!Development | |||
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|-style="background:WhiteSmoke; color:black" | |||
|AR-N8200.06 AllResist | |||
|LabSpin E-5, 4000 rpm, 60s, softbaked 10 min @ 150 degC | |||
|09-02-2016, JBX9500 E-2, 2nA aperture 5, doses 40-600 µC/cm2, 100 nm lines and 300 nm spaces | |||
|11-02-2016, Fumehood D-2, AR-600-546, rinsed in IPA 60s. | |||
|02-03-2016 AFM Icon, F-2, ScanAsyst in Air | |||
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Spin coating | Spin coating | ||