Specific Process Knowledge/Wafer and sample drying/Critical Point Dryer: Difference between revisions
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After drying wafers in air, the majority of the cantilevers are bended and sticking to the underlying surface. But after the wafers were dried in Critical point dryer, the cantilevers were free hanging. | After drying wafers in air, the majority of the cantilevers are bended and sticking to the underlying surface. But after the wafers were dried in Critical point dryer, the cantilevers were free hanging. | ||
[[Image:SiN dried air.jpg|350x350px|left|thumb|Dried in air: most cantilevers are bended.]] | [[Image:SiN dried air.jpg|350x350px|left|thumb|Dried in air: most cantilevers are bended.]] | ||
Dried in air: most cantilevers are bended. | '''Dried in air''': most cantilevers are bended. | ||
[[Image:SiN cantilever dried CPD.jpg|350x350px|left|thumb|Dried with Critical Point Dryer. ]] | [[Image:SiN cantilever dried CPD.jpg|350x350px|left|thumb|Dried with Critical Point Dryer. ]] | ||
Dried with Critical Point Dryer. The cantilevers are free hanging, and have not bended. The dimensions of the cantilevers are 100 x 710 µm, and the thickness is about 0.5 µm. | '''Dried with Critical Point Dryer'''. The cantilevers are free hanging, and have not bended. The dimensions of the cantilevers are 100 x 710 µm, and the thickness is about 0.5 µm. | ||
[[Image:SiN cantilever dried CPD nr7.jpg|350x350px|left|thumb|Dried with Critical Point Dryer.]] | [[Image:SiN cantilever dried CPD nr7.jpg|350x350px|left|thumb|Dried with Critical Point Dryer.]] | ||
Dried with the Critical Point Dryer. The cantilevers structures are free hanging after the drying. | '''Dried with the Critical Point Dryer'''. The cantilevers structures are free hanging after the drying. | ||
An acknowledgment goes to Tom Larsen, Nanoprobes, DTU Nanotech, who provided the pictures. | An acknowledgment goes to Tom Larsen, Nanoprobes, DTU Nanotech, who provided the pictures. | ||