Specific Process Knowledge/Thin film deposition/Deposition of Tungsten: Difference between revisions
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| Substrate gets hot during deposition | | Substrate gets hot during deposition | ||
(for a 60 nm film it rose above 123 C) | (for a 60 nm film it rose above 123 C) | ||
| | |Deposition rate is 0.083 nm/s for 150W and 3mTorr | ||
|} | |} | ||
'''*''' ''For thicknesses above 20 nm talk to staff (write to thinfilm@danchip.dtu.dk), as the heat and subsequent pressure rise means the deposition needs to be carried out in steps.'' | '''*''' ''For thicknesses above 20 nm talk to staff (write to thinfilm@danchip.dtu.dk), as the heat and subsequent pressure rise means the deposition needs to be carried out in steps.'' | ||