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Specific Process Knowledge/Thin film deposition/Deposition of Platinum: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,377 edits
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|Ar ion source
|Ar ion source
|RF Ar clean
|none
|RF Ar clean
|RF Ar clean


Line 30: Line 30:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
! Layer thickness
! Layer thickness
|10Å - 1µm*
|10Å - 600nm*
|10Å to 5000Å*
|10Å - 600nm*
|10Å to 5000Å
|10Å - 600nm*
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
! Deposition rate
! Deposition rate
|0.5Å/s to 10Å/s
|0.5Å/s to 10Å/s
|10Å/s to 15Å/s
|0.5Å/s to 10Å/s
|? Å/s to ? Å/s
|? Å/s to ? Å/s
|-
|-
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