Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-3: Difference between revisions
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*[[Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope|Addition of Picoscope oscilloscope system for process monitoring]] | *[[Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope|Addition of Picoscope oscilloscope system for process monitoring]] | ||
The original (fast switching and with a maximum flow of 1200 sccm) SF<sub>6</sub> MFC was causing problems for a long a time so it was replaced by two new MFC's | The original (fast switching and with a maximum flow of 1200 sccm) SF<sub>6</sub> MFC was causing problems for a long a time so it was replaced by two new MFC's: | ||
* SF6-1: Fast switching MFC for Bosch processes with a maximum flow rate of 600 sccm. It sits in the position of the old 1200 sccm MFC on top of the plasma source.* SF6-2: Normal MFC for continuous processes with a maximum flow rate of 100 sccm. It is installed in the gas cabinet next to the Ar MFC. | * SF6-1: Fast switching MFC for Bosch processes with a maximum flow rate of 600 sccm. It sits in the position of the old 1200 sccm MFC on top of the plasma source. | ||
* SF6-2: Normal MFC for continuous processes with a maximum flow rate of 100 sccm. It is installed in the gas cabinet next to the Ar MFC. | |||