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Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,721 edits
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|-
|-
|-style="background:#C0C0C0;" align="center"
|-style="background:#C0C0C0;" align="center"
|align="left"|Silicon oxide || (x) ||  || x || (x) ||
|align="left"| Silicon oxide || (x) ||  || x || (x) ||
|-
|-
|-style="background:#DCDCDC;" align="center"
|-style="background:#DCDCDC;" align="center"
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|-
|-
|-style="background:#C0C0C0;" align="center"
|-style="background:#C0C0C0;" align="center"
|align="left"| Glass (borofloat/pyrex) || x ||  || x || (x) || Dehydration before HMDS for best result
|align="left"| Glass (borofloat/pyrex) || x ||  || x || (x) || Dehydration before HMDS is probably best
|-
|-
|-style="background:#DCDCDC;" align="center"
|-style="background:#DCDCDC;" align="center"
|align="left"| Fused silica || x ||  || x || (x) || Dehydration before HMDS for best result
|align="left"| Fused silica || x ||  || x || (x) || Dehydration before HMDS is probably best
|-
|-style="background:#C0C0C0;" align="center"
|align="left"| InGaAs || (x) ||  ||  || SurPass 3000 ||
|-
|-style="background:#DCDCDC;" align="center"
|align="left"| GaAs || (x) ||  ||  || SurPass 3000 ||
|-
|-style="background:#C0C0C0;" align="center"
|align="left"| GaP || (x) ||  ||  || ? || AR800-30 is being tested (leaves residue)
|-
|-style="background:#DCDCDC;" align="center"
|align="left"| InP || (x) ||  ||  || ? || AR800-30 is being tested (leaves residue)
|}
|}


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=HMDS=
=HMDS=
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