Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch: Difference between revisions
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Image:dose250_no2_09.jpg |250 J/m2 1000nm/510nm | Image:dose250_no2_09.jpg |250 J/m2 1000nm/510nm | ||
Image:dose260_no2_15.jpg |260 J/m2 1000nm/493nm | Image:dose260_no2_15.jpg |260 J/m2 1000nm/493nm | ||
Image:dose270_no2_22.jpg | | Image:dose270_no2_22.jpg |270 J/m2 1000nm/494nm | ||
</gallery> | </gallery> | ||