Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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Pegasus 2 stands out as it is a dedicated research tool where the research group of professor Henri Jansen [mailto:henrija@dtu.dk] has freedom to explore the conventions of dry etching. This requires that a very strict control be applied to the process chamber in terms of the range of processes and substrates used. As such, the instrument will not be released for general use for a wide range of applications. | Pegasus 2 stands out as it is a dedicated research tool where the research group of professor Henri Jansen [mailto:henrija@dtu.dk] has freedom to explore the conventions of dry etching. This requires that a very strict control be applied to the process chamber in terms of the range of processes and substrates used. As such, the instrument will not be released for general use for a wide range of applications. | ||
Whereas most dry etch tools are intended to serve as stable platforms with limited or no changes in hardware, Pegasus 2 will be subject to experiments. For instance, as of the end of 2020 the instrument has been set up to run | Whereas most dry etch tools are intended to serve as stable platforms with limited or no changes in hardware, Pegasus 2 will be subject to experiments. For instance, as of the end of 2020 the instrument has been set up to run [http://labadviser.nanolab.dtu.dk/images/d/d6/CORE1.pdf '''the CORE process''']. This means that comparing to [[Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-1|DRIE-Pegasus 1]] and | ||
[[Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-3|DRIE-Pegasus 3]], Pegasus 2 and its allowed usage have been modified (this list is not complete - see the complete list in the table below): | |||
[[Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-3|DRIE-Pegasus 3]], Pegasus 2 is | # The C<sub>4<\sub>F<sub>8<\sub> MFC has been disconnected to maintain a carbon-free (carbon containing masks are allowed) chamber. | ||
# The RF generator supplying the power to the coil has been disconnected thus allowing only processes driven by the platen generator. | |||
This kind of experiment will not be allowed on other dry etch tools. Therefore, you should always make sure that whatever process you may want to run on Pegasus 2 is allowed or even possible. The table below should provide this information. | |||
RF generator supplying the power to the coil has been disconnected thus allowing only processes driven by the platen generator. This kind of experiment will not be allowed on other dry etch tools. Therefore, you should always make sure that whatever process you may want to run on Pegasus 2 is allowed or even possible. The table below should provide this information. | |||
If you want to get access to the tool, then talk to professor Henri Jansen and the dry etch group. | If you want to get access to the tool, then talk to professor Henri Jansen and the dry etch group. | ||