Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions
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Revision as of 17:07, 15 January 2021
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Jipelec - Rapid Thermal Processing
The Jipelec is a rapid thermal processing (RTP) oven. It is be used for fast and well-controlled annealing or alloying of samples. It is possible to use either a thermocouple or a pyrometer to control the temperature (of the sample carrier).
The user manual, technical information and contact information can be found in LabManager:
| Purpose | RTP annealing | |
|---|---|---|
| Process parameter range | Process Temperature |
|
| Process pressure |
| |
| Gases on the system |
| |
| Substrates | Batch size |
|
| Substrate materials allowed |
A carrier is always needed: For III-V materials a carbide carrier is used, and for other samples a silicon carrier wafer with 1 µm oxide is used
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