Specific Process Knowledge/Cleanroom Chemicals: Difference between revisions
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*AR 600-546 (Amyl acetate) | *AR 600-546 (Amyl acetate) | ||
*AZ 351B (NaOH based with disodium tetraborate buffer) | *AZ 351B (NaOH based with disodium tetraborate buffer) | ||
*AZ 726 MIF (TMAH based) | *AZ 726 MIF (TMAH based with surfactants added for fast and homogeneous substrate wetting) | ||
*mr-Dev 600 (PGMEA) | *mr-Dev 600 (PGMEA) | ||
*ZED-N50 (n-Amylacetate) | *ZED-N50 (n-Amylacetate) | ||
Revision as of 14:20, 21 December 2020
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This page lists the chemicals that are made available in the cleanroom by Nanolab, covered by the cleanroom access hourly rate.
Acids, bases, and etchants
- Ammonia solution 28%
- Ammonium persulphate (Powder)
- BHF (Mixture of Ammonium fluoride, Ammonium bi fluoride, Hydroflouric acid)
- BOE 7:1 without surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid)
- BOE 7:1 with surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid)
- Boric acid
- Chrome ETCH 18 (Mixture of Ceric ammonium nitrate, Perchloric acid, Nitric acid)
- HF 5%
- HF 40%
- Hydrochloric acid 37%
- Hydrogen peroxide 31%
- Nitric acid 69%
- Phosphoric acid 85%
- Potassium hydroxide (Pellets)
- Potassium hydroxide 50%
- Sulfamic acid
- Sulfuric acid 96%
Developers
- AR 600-546 (Amyl acetate)
- AZ 351B (NaOH based with disodium tetraborate buffer)
- AZ 726 MIF (TMAH based with surfactants added for fast and homogeneous substrate wetting)
- mr-Dev 600 (PGMEA)
- ZED-N50 (n-Amylacetate)
Resists
- AR-P 6200.09
- AZ 4562
- AZ 5214E
- AZ MiR 701 (29cps)
- DUV42S-6 (BARC for stepper)
- KRF M230Y 6cp
- KRF M35G 27cp
- SU-8 2005
- SU-8 2035
- SU-8 2075
Solvents
- 2-Propanol "IPA"
- Acetone
- Anisole
- AR 600-71 (Mixture of Dioxolane, PGME)
- A-Thinner (Anisole)
- Ethanol
- MIBK
- PGMEA (available as mr-Dev 600)
- Remover 1165 (NMP)
Other chemicals
- HMDS