Specific Process Knowledge/Cleanroom Chemicals: Difference between revisions

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'''THIS PAGE IS UNDER CONSTRUCTION''' [[Image:section under construction.jpg|70px]]
'''THIS PAGE IS UNDER CONSTRUCTION''' [[Image:section under construction.jpg|70px]]


=Acids and bases=
=Acids, bases, and etchants=
*Ammonia solution 28%
*Ammonium persulphate (Powder)
*BHF (Mixture of Ammonium fluoride, Ammonium bi fluoride, Hydroflouric acid)
*BHF (Mixture of Ammonium fluoride, Ammonium bi fluoride, Hydroflouric acid)
*BOE 7:1 without surfactant (Mixture of Ammonium fluoride, Ammoniumbi fluoride, Hydroflouric acid)
*BOE 7:1 without surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid)
*BOE 7:1 with surfactant (Mixture of Ammonium fluoride, Ammoniumbi fluoride, Hydroflouric acid)
*BOE 7:1 with surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid)
*Boric acid
*Chrome ETCH 18 (Mixture of Ceric ammonium nitrate, Perchloric acid, Nitric acid)
*HF 5%
*HF 5%
*HF 40%
*HF 40%
*Hydrochloric acid 37%
*Hydrogen peroxide 31%
*Nitric acid 69%
*Nitric acid 69%
*Phosphoric acid 85%
*Potassium hydroxide (Pellets)
*Potassium hydroxide 50%
*Sulfamic acid
*Sulfuric acid 96%


=Developers=
=Developers=
AR 600-546 (Amyl acetate)
*AR 600-546 (Amyl acetate)
AZ 351B (NaOH based)
*AZ 351B (NaOH based)
AZ 726 MIF (TMAH based)
*AZ 726 MIF (TMAH based)
ZED-N50 (n-Amylacetate)
*mr-Dev 600 (PGMEA)
 
*ZED-N50 (n-Amylacetate)
=Etchants=


=Resists=
=Resists=
*AR-P 6200.09
*AR-P 6200.09
*AZ 4562
*AZ 5214E
*AZ MiR 701 (29cps)
*DUV42S-6 (BARC for stepper)
*DUV42S-6 (BARC for stepper)
*KRF M230Y 6cp
*KRF M35G 27cp
*SU-8 2005
*SU-8 2005
*SU-8 2035
*SU-8 2035
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=Solvents=
=Solvents=
*1165
*2-Propanol "IPA"
*Acetone
*Acetone
*Anisole
*Anisole
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*A-Thinner (Anisole)
*A-Thinner (Anisole)
*Ethanol
*Ethanol
*IPA
*MIBK
*MIBK
*PGMEA
*PGMEA (available as mr-Dev 600)
*Remover 1165 (NMP)


=Other chemicals=
=Other chemicals=
*HMDS
*HMDS

Revision as of 15:03, 21 December 2020

THIS PAGE IS UNDER CONSTRUCTION Section under construction.jpg

Acids, bases, and etchants

  • Ammonia solution 28%
  • Ammonium persulphate (Powder)
  • BHF (Mixture of Ammonium fluoride, Ammonium bi fluoride, Hydroflouric acid)
  • BOE 7:1 without surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid)
  • BOE 7:1 with surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid)
  • Boric acid
  • Chrome ETCH 18 (Mixture of Ceric ammonium nitrate, Perchloric acid, Nitric acid)
  • HF 5%
  • HF 40%
  • Hydrochloric acid 37%
  • Hydrogen peroxide 31%
  • Nitric acid 69%
  • Phosphoric acid 85%
  • Potassium hydroxide (Pellets)
  • Potassium hydroxide 50%
  • Sulfamic acid
  • Sulfuric acid 96%

Developers

  • AR 600-546 (Amyl acetate)
  • AZ 351B (NaOH based)
  • AZ 726 MIF (TMAH based)
  • mr-Dev 600 (PGMEA)
  • ZED-N50 (n-Amylacetate)

Resists

  • AR-P 6200.09
  • AZ 4562
  • AZ 5214E
  • AZ MiR 701 (29cps)
  • DUV42S-6 (BARC for stepper)
  • KRF M230Y 6cp
  • KRF M35G 27cp
  • SU-8 2005
  • SU-8 2035
  • SU-8 2075

Solvents

  • 2-Propanol "IPA"
  • Acetone
  • Anisole
  • AR 600-71 (Mixture of Dioxolane, PGME)
  • A-Thinner (Anisole)
  • Ethanol
  • MIBK
  • PGMEA (available as mr-Dev 600)
  • Remover 1165 (NMP)

Other chemicals

  • HMDS