Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Cretch: Difference between revisions
Created page with "A quasi atomic layer etching of chromium." |
No edit summary |
||
| Line 1: | Line 1: | ||
A quasi atomic layer etching of chromium. | A quasi atomic layer etching of chromium. | ||
Read more on [[media:Cr and CrOx etching using SF6 and O2 plasma.pdf | Cr and CrO<sub>x</sub> etching using SF<sub>6</sub> and O2 plasma]] | |||
Latest revision as of 09:45, 13 September 2021
A quasi atomic layer etching of chromium. Read more on Cr and CrOx etching using SF6 and O2 plasma