Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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[[Image:Pegasus 2 operator.jpg |frame|x400px|The DRIE-Pegasus 2 operator station and load lock in the DTU Nanolab cleanroom A-1]] | [[Image:Pegasus 2 operator.jpg |frame|x400px|The DRIE-Pegasus 2 operator station and load lock in the DTU Nanolab cleanroom A-1]] | ||
'''The user manual(s) | '''The user manual(s), user APV(s), technical information and contact information can be found in LabManager:''' | ||
Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=398| LabManager] | Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=398| LabManager] | ||
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|ItemComment= The absence of carbon containing etch gasses ensures that the process chamber is kept clean. | |ItemComment= The absence of carbon containing etch gasses ensures that the process chamber is kept clean. | ||
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== Process information == | |||