Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions

Pegasus 2 is a dedicated research tool where the research group of professor Henri Jansen [mailto:henrija@dtu.dk] has freedom to explore the conventions of dry etching. This requires that a very strict control be applied to the process chamber in terms of the range of processes and substrates used. As such, the instrument will not be released for general use for a wide range of applications.  

If you want to get access to the tool, then talk to professor Henry Jansen

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