Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions

Revision as of 10:33, 14 December 2020

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If you want to get access to the tool, then talk to professor Henry Jansen

Click here to access older configurations.

The current configuration is

Pegasus 2 configuration table version 1

**Currently valid from November 2020 onwards**
Item	The currently applied modification	Comments
Available gasses and gas chemistry	Available gasses: SF₆: 50 sccm O₂: 50 sccm Ar: 283 N₂: 500 sccm He: 11 sccm Not available: C₄F₈ (H₂ currently fitted but closed) : 0 sccm CO₂: (It is not in the software)	OnlySF₆ and O₂ are used for Si, PR, and Cr etch. The rest is only make-up

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 == Current setup and rules on Pegasus 2 ==
 Click [[Specific Process Knowledge/DRIE-Pegasus/Pegasus-2/OldConfig | '''here''']] to access older configurations.
 The current configuration is
 {{Template:Peg2configheader1
 |TableHeader= Currently valid from November 2020 onwards
 }}
 {{Template:Peg2configcontent1
 |ItemName= Available gasses and gas chemistry
+|ItemConfiguration= '''Available gasses:'''
-|ItemConfiguration= .
 * SF<sub>6</sub>: 50 sccm
 * O<sub>2</sub>: 50 sccm
 * Ar: 283
-* C<sub>4</sub>F<sub>8</sub> (H2 currently fitted but closed) : 0 sccm
 * N<sub>2</sub>: 500 sccm
 * He: 11 sccm
+'''Not available:'''
+* C<sub>4</sub>F<sub>8</sub> (H<sub>2</sub> currently fitted but closed) : 0 sccm
 * CO<sub>2</sub>: (It is not in the software)
 |ItemComment=OnlySF<sub>6</sub> and O<sub>2</sub> are used for Si, PR, and Cr etch. The rest is only make-up
 }}