Specific Process Knowledge/Etch/OES: Difference between revisions

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 '''The OES hardware:'''<br>
-On a viewport preferably directly facing the plasma above the wafer is chosen. Here, a lens is mounted to focus the emitted light onto an optical fiber feeding it to a spectrometer. The Verity spectrograph and SD1024 controller with SpectraView software are installed on the tools in the list above. It has a 200 nm to 800 nm range with a 0.5 nm step
+The light emitted from the plasma is collected through a view port in the process chamber - preferably directly facing the plasma itself above the wafer. A lens is mounted to focus the light onto an optical fiber feeding it to a spectrometer. The Verity spectrograph and SD1024 controller with SpectraView software are installed on the tools in the list above. It has a 200 nm to 800 nm range with a 0.5 nm step enabling the simultaneous monitoring of any number of narrow bandwidths as a function of time.
-enabling the monitoring of the intensity of certain narrow bandwidths stic of etch process reactants and etch products
 '''SpectraView:'''<br>
-The SpectraView software
+At the center of the SpectraView software is the configuration file (*.svc file) that dictates what to be done.
+Below is a figure