Specific Process Knowledge/Etch/OES: Difference between revisions
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'''The OES hardware:'''<br> | '''The OES hardware:'''<br> | ||
On a viewport preferably directly facing the plasma above the wafer is chosen. Here, a lens is mounted to focus the emitted light onto an optical fiber feeding it to a spectrometer. The Verity spectrograph and SD1024 controller with SpectraView software are installed on the tools in the list above. It has a 200 nm to 800 nm range with a 0.5 nm step | On a viewport preferably directly facing the plasma above the wafer is chosen. Here, a lens is mounted to focus the emitted light onto an optical fiber feeding it to a spectrometer. The Verity spectrograph and SD1024 controller with SpectraView software are installed on the tools in the list above. It has a 200 nm to 800 nm range with a 0.5 nm step | ||
enabling the monitoring of the intensity of certain narrow bandwidths stic of etch process reactants and etch products | |||
'''SpectraView:'''<br> | '''SpectraView:'''<br> | ||