Specific Process Knowledge/Etch/OES: Difference between revisions
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'''The intensity of the light:'''<br> | '''The intensity of the light:'''<br> | ||
The intensity of the light will depend on whether the molecule is a reactant or an etch product:# Reactant: The concentration in the plasma:** The carrier gas flow rate** The RF power (both coil and platen)** The process pressure | The intensity of the light will depend on whether the molecule is a reactant or an etch product: | ||
# Reactant: The concentration in the plasma: | |||
** The carrier gas flow rate | |||
** The RF power (both coil and platen) | |||
** The process pressure | |||
# Etch product: | # Etch product: | ||