Specific Process Knowledge/Etch/OES: Difference between revisions
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'''The plasma:'''<br> | '''The plasma:'''<br> | ||
Inside the process chamber, the RF field will cause electrons to get pulled off the gas atoms to form ions, radicals and free, fast moving electrons. As the electrons | Inside the process chamber, the RF field will cause electrons to get pulled off the gas atoms to form ions, radicals and free, fast moving electrons. As the electrons collide with the gas constituents, they latter are pushed into excited states from which they may decay under emission of photons. With a set of characteristic | ||
These photons typically have an energy in the visible range and hence the plasma emits light at certain wavelengths | These photons typically have an energy in the visible range and hence the plasma emits light at certain wavelengths | ||