Specific Process Knowledge/Etch/OES: Difference between revisions

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| In||325.6
| In||325.6
|-
|-
| AlCl||261.4 || || N||674.0
| AlCl||261.4 || N||674.0
|-
|-
| As||235.0 || ||  N2||315.9, 337.1
| As||235.0 ||  N2||315.9, 337.1
|-
|-
| C2||516.5 || ||  NO||247.9, 288.5, 289.3, 303.5, 304.3, 319.8, 320.7, 337.7, 338.6
| C2||516.5 ||  NO||247.9, 288.5, 289.3, 303.5, 304.3, 319.8, 320.7, 337.7, 338.6
|-
|-
| CF2||251.9 || ||  O||777.2, 844.7
| CF2||251.9 ||  O||777.2, 844.7
|-
|-
| Cl||741.4 || ||  OH||281.1, 306.4, 308.9
| Cl||741.4 ||  OH||281.1, 306.4, 308.9
|-
|-
| CN||289.8, 304.2, 387.0 || ||  S||469.5
| CN||289.8, 304.2, 387.0 ||  S||469.5
|-
|-
| CO||292.5, 302.8, 313.8, 325.3, 482.5, 483.5, 519.8 || ||  Si||288.2
| CO||292.5, 302.8, 313.8, 325.3, 482.5, 483.5, 519.8 ||  Si||288.2
|-
|-
| F||703.7, 712.8 || ||  SiCl||287.1
| F||703.7, 712.8 ||  SiCl||287.1
|-
|-
| Ga||417.2 || || SiF||440.1, 777.0
| Ga||417.2 || SiF||440.1, 777.0
|-
|-
| H||486.1, 656.5 || || ||
| H||486.1, 656.5 || ||
|-
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|}
|}

Revision as of 13:21, 26 November 2020

Optical endpoint detection on the dry etch tools at DTU Nanolab

Several dry etch tools at DTU Nanolab are equipped with an endpoint detection system. Out of those systems only one is not of the type optical endpoint detection. The instruments are:

  • ICP Metal Etch
  • III-V ICP
  • Pegasus 1
  • Pegasus 4

The section below describes

fdgsdfg

Monitored species Wavelength (nm) Monitored species Wavelength (nm)
Al 308.2, 309.3, 396.1 In 325.6
AlCl 261.4 N 674.0
As 235.0 N2 315.9, 337.1
C2 516.5 NO 247.9, 288.5, 289.3, 303.5, 304.3, 319.8, 320.7, 337.7, 338.6
CF2 251.9 O 777.2, 844.7
Cl 741.4 OH 281.1, 306.4, 308.9
CN 289.8, 304.2, 387.0 S 469.5
CO 292.5, 302.8, 313.8, 325.3, 482.5, 483.5, 519.8 Si 288.2
F 703.7, 712.8 SiCl 287.1
Ga 417.2 SiF 440.1, 777.0
H 486.1, 656.5

sdfg

Monitored species Wavelength (nm) Monitored species Wavelength (nm)
Al 308.2, 309.3, 396.1 H 486.1, 656.5
AlCl 261.4 In 325.6
As 235.0 N 674.0
C2 516.5 N2 315.9, 337.1
CF2 251.9 NO 247.9, 288.5, 289.3, 303.5, 304.3, 319.8, 320.7, 337.7, 338.6
Cl 741.4 O 777.2, 844.7
CN 289.8, 304.2, 387.0 OH 281.1, 306.4, 308.9
CO 292.5, 302.8, 313.8, 325.3, 482.5, 483.5, 519.8 S 469.5
F 703.7, 712.8 Si 288.2
Ga 417.2 SiCl 287.1