Specific Process Knowledge/Etch/OES: Difference between revisions

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The section below describes
The section below describes


{| {{table}}| align="center" style="background:#f0f0f0;"|'''Monitored species'''| align="center" style="background:#f0f0f0;"|'''Wavelength (nm)'''|-| Al||308.2, 309.3, 396.1|-| AlCl||261.4|-| As||235.0|-| C2||516.5|-| CF2||251.9|-| Cl||741.4|-| CN||289.8, 304.2, 387.0|-| CO||292.5, 302.8, 313.8, 325.3, 482.5, 483.5, 519.8|-| F||703.7, 712.8|-| Ga||417.2|-| H||486.1, 656.5|-| In||325.6|-| N||674.0|-| N2||315.9, 337.1|-| NO||247.9, 288.5, 289.3, 303.5, 304.3, 319.8, 320.7, 337.7, 338.6|-| O||777.2, 844.7|-| OH||281.1, 306.4, 308.9|-| S||469.5|-| Si||288.2|-| SiCl||287.1|-| SiF||440.1, 777.0|-| |}
{| {{table}}
| align="center" style="background:#f0f0f0;"
|'''Monitored species'''
| align="center" style="background:#f0f0f0;"
|'''Wavelength (nm)'''
|-
| Al||308.2, 309.3, 396.1
|-
| AlCl||261.4
|-
| As||235.0
|-
| C2||516.5
|-
| CF2||251.9
|-
| Cl||741.4
|-
| CN||289.8, 304.2, 387.0
|-
| CO||292.5, 302.8, 313.8, 325.3, 482.5, 483.5, 519.8
|-
| F||703.7, 712.8
|-
| Ga||417.2
|-
| H||486.1, 656.5
|-
| In||325.6
|-
| N||674.0
|-
| N2||315.9, 337.1
|-
| NO||247.9, 288.5, 289.3, 303.5, 304.3, 319.8, 320.7, 337.7, 338.6
|-
| O||777.2, 844.7
|-
| OH||281.1, 306.4, 308.9
|-
| S||469.5
|-
| Si||288.2
|-
| SiCl||287.1
|-
| SiF||440.1, 777.0
|-
|  
|}

Revision as of 13:04, 26 November 2020

Optical endpoint detection on the dry etch tools at DTU Nanolab

Several dry etch tools at DTU Nanolab are equipped with an endpoint detection system. Out of those systems only one is not of the type optical endpoint detection. The instruments are:

  • ICP Metal Etch
  • III-V ICP
  • Pegasus 1
  • Pegasus 4

The section below describes

align="center" style="background:#f0f0f0;" Monitored species align="center" style="background:#f0f0f0;" Wavelength (nm)
Al 308.2, 309.3, 396.1
AlCl 261.4
As 235.0
C2 516.5
CF2 251.9
Cl 741.4
CN 289.8, 304.2, 387.0
CO 292.5, 302.8, 313.8, 325.3, 482.5, 483.5, 519.8
F 703.7, 712.8
Ga 417.2
H 486.1, 656.5
In 325.6
N 674.0
N2 315.9, 337.1
NO 247.9, 288.5, 289.3, 303.5, 304.3, 319.8, 320.7, 337.7, 338.6
O 777.2, 844.7
OH 281.1, 306.4, 308.9
S 469.5
Si 288.2
SiCl 287.1
SiF 440.1, 777.0