Jump to content

Specific Process Knowledge/Lithography: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Line 376: Line 376:
'''<big>Resists</big>'''
'''<big>Resists</big>'''
*[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|UV Resist Overview]] (links to manufacturers, technical data, process flows, etc)
*[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|UV Resist Overview]] (links to manufacturers, technical data, process flows, etc)
**[[Specific_Process_Knowledge/Lithography/5214E|AZ 5214E]]
**[[Specific_Process_Knowledge/Lithography/4562|AZ 4562]]
**[[Specific_Process_Knowledge/Lithography/MiR|AZ MiR 701 (29cps)]]
**[[Specific_Process_Knowledge/Lithography/nLOF|Az nLOF 2020]]
**[[Specific_Process_Knowledge/Lithography/SU-8|SU-8]]
*[[Specific_Process_Knowledge/Lithography/EBeamLithography#E-beam_resists|E-beam Resist Overview]]
*[[Specific_Process_Knowledge/Lithography/EBeamLithography#E-beam_resists|E-beam Resist Overview]]


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography"