Specific Process Knowledge/Characterization/XPS/Nexsa: Difference between revisions

@@ Line 35: / Line 35: @@
 *[[Specific Process Knowledge/Characterization/XPS/Raman|Raman spectroscopy]]
 *[[Specific Process Knowledge/Characterization/XPS/UPS technique|Ultraviolet Photoelectron Spectroscopy or UPS]]
+*[[Specific Process Knowledge/Characterization/XPS/NexsaOverview|Table with a set of publications in which multiple techniques are used]]
 '''Specific measurements'''
+The Nexsa will allow you to characterize the sample in many ways. The list of parameters that can be determined are:
-The Nexsa is capable of measuring a lot of
+; Work function
-; Work function measurements
 : Based on the measurements of the Fermi Level and the spectrum energy cut-off in a UPS spectrum, the work function may be measured. The Nexsa manual section 3.6.x has more information.
 ; Band gap measurements
-:
+: Based on the REELS spectra the band gap may be determined.
-; Mapping electronic bands using Angle resolved XPS (ARXPS) and UPS (ARUPS)
+; Electronic band structure
-: The Nexsa is capable of measuring the following
+: Using Angle resolved XPS (ARXPS) and UPS (ARUPS) the electronic band structure may be mapped.
-*[[Specific Process Knowledge/Characterization/XPS/NexsaOverview|Table with a set of publications in which multiple techniques are used]]
 == Getting access to the XPS ==