Specific Process Knowledge/Etch/Etching of Chromium: Difference between revisions
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#Add water until 600 ml - keep stirring (use magnetic stirring) | #Add water until 600 ml - keep stirring (use magnetic stirring) | ||
#Add 90 ml HNO<math>_3</math> | #Add 90 ml HNO<math>_3</math> | ||
#When the | #When the cerisulphate is completely dissolved (Clear liquid) you can add the other 600 ml of wafer. | ||