Specific Process Knowledge/Thin film deposition/PECVD/Doping: Difference between revisions
No edit summary |
|||
| Line 84: | Line 84: | ||
[[image:PECVD_Boron_doping_profiles.jpg|627x424px|left|thumb|Boron concentration measured by SIMS. Results from Trine Holm Christensen, Space, Feb. 2015.]] | [[image:PECVD_Boron_doping_profiles.jpg|627x424px|left|thumb|Boron concentration measured by SIMS. Results from Trine Holm Christensen, Space, Feb. 2015.]] | ||
<br clear="all" /> | |||
Measured peak concentrations and sheet resistances: | Measured peak concentrations and sheet resistances: | ||
<br> | |||
{| border="1" cellspacing="0" cellpadding="7" with="50" style="text-align:center;" | {| border="1" cellspacing="0" cellpadding="7" with="50" style="text-align:center;" | ||
|- | |- | ||