Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
| Line 58: | Line 58: | ||
!Allowed materials | !Allowed materials | ||
| | | | ||
Silicon, glass, and polymer substrates | Silicon, glass, and polymer substrates (Tg > 150°C) | ||
Film or pattern of all but types, except type IV and resist/polymer | Film or pattern of all but types, except type IV and resist/polymer | ||