Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Black silicon on Demand: Difference between revisions
No edit summary |
No edit summary |
||
| Line 1: | Line 1: | ||
'''Feedback to this page: | '''Feedback to this page: | ||
[mailto:labadviser@ | [mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Black silicon on Demand click here]''' | ||
<!-- Page reviewed 9/8-2022 jmli --> | |||
Black silicon (BSi or silicon micro/nano-grass) is a frequently encountered phenomenon in highly directional etching of silicon using mainstream plasma etch tools. Because of the almost perfect light absorption, BSi has found a prominent place in photovoltaic applications. The strongly increased surface area has also shown attractive opportunities in chemical and optical devices. In addition, another already established characteristic of BSi is its ability to prevent cell growth and as such creates anti-bacterial, anti-fogging and self-cleaning surfaces. | Black silicon (BSi or silicon micro/nano-grass) is a frequently encountered phenomenon in highly directional etching of silicon using mainstream plasma etch tools. Because of the almost perfect light absorption, BSi has found a prominent place in photovoltaic applications. The strongly increased surface area has also shown attractive opportunities in chemical and optical devices. In addition, another already established characteristic of BSi is its ability to prevent cell growth and as such creates anti-bacterial, anti-fogging and self-cleaning surfaces. | ||