Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Black silicon on Demand: Difference between revisions
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On DRIE-Pegasus 2, the formation and controllabilty of BSi in the CORE sequence is different from how BSi presents itself in the FC-based sequences. By manipulating process parameters and utilizing the self-limiting property of the oxidation step, the CORE process can easily be modified to create either BSi-full or BSi-free surfaces independent of the aspect ratio of the etching features. Therefore this method provides a versatile tool for creating BSi anywhere at anytime or - as we call it - ‘BSi on Demand’. | On DRIE-Pegasus 2, the formation and controllabilty of BSi in the CORE sequence is different from how BSi presents itself in the FC-based sequences. By manipulating process parameters and utilizing the self-limiting property of the oxidation step, the CORE process can easily be modified to create either BSi-full or BSi-free surfaces independent of the aspect ratio of the etching features. Therefore this method provides a versatile tool for creating BSi anywhere at anytime or - as we call it - ‘BSi on Demand’. | ||
<gallery> | <gallery> | ||
File:Bsi.png|CORE recipe for BSi | File:Bsi.png|800px|CORE recipe for BSi | ||
</gallery> | </gallery> | ||