Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions

Revision as of 11:06, 11 May 2020 view source Vthongu (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 188 edits →This system is a research tool and not available to the users ← Older edit		Revision as of 11:07, 11 May 2020 view source Vthongu (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 188 edits →This system is a research tool and not available to the users Newer edit →
Line 8:		Line 8:


	*[[/Si Nano ~~Etch~~\| Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>]]		*[[/Si Nano Etching\|Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>]]
	*[[/Si Nano ~~Etch~~\| Black silicon on Demand]]		*[[/Si Nano Etching\|Black silicon on Demand]]