Specific Process Knowledge/Characterization/XRD/XRD SmartLab: Difference between revisions
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==Characterization of thin films using X-ray reflectivity (XRR)== | |||
Implementing the XRR method the user can calculate thickness, density, and roughness of the deposited material. The XRR is also widely employed for multilayer stack analysis. | |||
Here are some results available: | |||
* Characterization of e-beam deposited Al thin films. | |||
* Characterization of ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> ultrathin layers. | |||