Specific Process Knowledge/Thin film deposition/Deposition of Aluminium Nitride: Difference between revisions
added the new cluster sputterer - halfway done |
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* 0nm - 200nm | * 0nm - 200nm | ||
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* 0nm - 50nm | * 0nm - 50nm | ||
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* Not tested | * Not tested | ||
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* 0.0625 nm/cycle on a flat sample | * 0.0625 nm/cycle on a flat sample | ||
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*Very good | *Very good | ||
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*Very good | *Very good | ||
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!Process Temperature | !Process Temperature | ||
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* Up to | * Up to 400<sup>o</sup>C | ||
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* 350<sup>o</sup>C | * 350<sup>o</sup>C | ||
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* 1x 100 mm wafer | * 1x 100 mm wafer | ||
* 1x 150 mm wafer | * 1x 150 mm wafer | ||
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*Several small samples | *Several small samples | ||
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*SU-8 | *SU-8 | ||
*Any metals | *Any metals | ||
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*Silicon | *Silicon | ||