Specific Process Knowledge/Thin film deposition/Deposition of Alumina: Difference between revisions
Added cluster sputterer pc1 |
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* 0.3 nm/min | * 0.3 nm/min | ||
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* 1.7 nm/min | * About 1.7 nm/min, depends on sputtering parameters | ||
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*0.088 - 0.097 nm/cycle (Using the "Al2O3" recipe, temperature dependent) | *0.088 - 0.097 nm/cycle (Using the "Al2O3" recipe, temperature dependent) | ||