Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions
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Old nitride furnace (SRN): | Old nitride furnace (SRN): | ||
*Uniformity within wafer: <4 % | *Uniformity within wafer: <4 % | ||
*Wafer-to-wafer uniformity: < | *Wafer-to-wafer uniformity: <5 % | ||
*Run-to-run uniformity: <3 % | *Run-to-run uniformity: <3 % | ||
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