Specific Process Knowledge/Wafer cleaning/Post CMP Cleaner: Difference between revisions
Appearance
| Line 55: | Line 55: | ||
<!-- |style="background:WhiteSmoke; color:black"| | <!-- |style="background:WhiteSmoke; color:black"| | ||
*Performance range --> | *Performance range --> | ||
|- | |||
!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Process parameter range | |||
|- | |- | ||
|style="background:LightGrey; color:black"|Mechanical Cleaning | |style="background:LightGrey; color:black"|Mechanical Cleaning | ||