Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions

@@ Line 31: / Line 31: @@
 |style="background:LightGrey; color:black"|Film thickness
 |style="background:WhiteSmoke; color:black"|
-*Si<sub>3</sub>N<sub>4</sub>: ~50Å - ~3000Å
+*Si<sub>3</sub>N<sub>4</sub>: ~50Å - ~1400Å
-*SRN: ~50Å - ~10000Å
+*SRN: ~50Å - ~2800Å
-Thick layers have to be deposited over more runs
+Thicker layers have to be deposited over more runs
 |-
 |style="background:LightGrey; color:black"|Step coverage