Specific Process Knowledge/Characterization/Stress measurement: Difference between revisions
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After you make a [[Specific_Process_Knowledge/Characterization/XRD/Process_Info#Theta-2Theta|θ-2θ scan]] of a crystalline thin film, the peak positions can be used to calculate the lattice constant of the film. By comparing the calculated lattice constant to the theoretical one, you can calculate the amount of compressive or tensile stress. It is important to align the thin film carefully to the beam height, as you can in the [[Specific_Process_Knowledge/Characterization/XRD/XRD SmartLab|XRD Smartlab]]. You may use a standard measurement (e.g. of a crystalline Si sample) to be able to take into account the intrinsic peak broadening of the instrument. Use the Ni-filter to remove the K<sub>β</sub> side peaks and if you have enough signal you can also use the monochromator and analyzer crystals to remove the K<sub>α2</sub> contribution. | After you make a [[Specific_Process_Knowledge/Characterization/XRD/Process_Info#Theta-2Theta|θ-2θ scan]] of a crystalline thin film, the peak positions can be used to calculate the lattice constant of the film. By comparing the calculated lattice constant to the theoretical one, you can calculate the amount of compressive or tensile stress. It is important to align the thin film carefully to the beam height, as you can in the [[Specific_Process_Knowledge/Characterization/XRD/XRD SmartLab|XRD Smartlab]]. You may use a standard measurement (e.g. of a crystalline Si sample) to be able to take into account the intrinsic peak broadening of the instrument. Use the Ni-filter to remove the K<sub>β</sub> side peaks and if you have enough signal you can also use the monochromator and analyzer crystals to remove the K<sub>α2</sub> contribution. | ||
Nanolab has the [[Specific_Process_Knowledge/Characterization/XRD/SLSII_analysis|SmartLab Studio software]] and the Malvern Panalytical HighScore software available for quantifying the stress (ask staff for details). | Nanolab has the [[Specific_Process_Knowledge/Characterization/XRD/SLSII_analysis|SmartLab Studio software]] and the Malvern Panalytical HighScore software available for quantifying the stress (ask staff for details). There is a good summary of the principles of the strain calculation in the [http://labmanager.dtu.dk/view_binary.php?fileId=4247 associated help document] for the SmartLab Studio software. | ||
You may be able to measure the relaxed lattice directly rather than comparing to a theoretical lattice, but you would have to be able to release the film and measure it separately (if this means scraping the thin film off your sample mechanically, you could potentially measure it in the [[Specific_Process_Knowledge/Characterization/XRD/XRD Powder|XRD Powder]], but | You may be able to measure the relaxed lattice directly rather than comparing to a theoretical lattice, but you would have to be able to release the film and measure it separately (if this means scraping the thin film off your sample mechanically, you could potentially measure it in the [[Specific_Process_Knowledge/Characterization/XRD/XRD Powder|XRD Powder]], but it would probably be difficult to get enough powder to get a good signal). | ||