Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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'''Accessible stage coordinates:''' <br> | '''Accessible stage coordinates:''' <br> | ||
'''High/Low Res''' X = | '''High/Low Res''' X = ±81?mm; Y = ±81?mm <br> | ||
'''Overview''' X = | '''Overview''' X = ±81?mm; Y = +12?mm to -150?mm <br> | ||
To be sure the Overview camera can be used to locate the first alignment mark, it is advised to use a mark in the bottom left portion (3<sup>rd</sup> quadrant) of the design as mark 1. <br> | To be sure the Overview camera can be used to locate the first alignment mark, it is advised to use a mark in the bottom left portion (3<sup>rd</sup> quadrant) of the design as mark 1. <br> | ||