Specific Process Knowledge/Characterization/Topographic measurement: Difference between revisions
m →Topographic measurements: Altered the structure of section titles |
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![[Specific Process Knowledge/Characterization/Profiler# | ![[Specific Process Knowledge/Characterization/Profiler#P17_stylus_profiler|P17 stylus profiler]] | ||
![[Specific Process Knowledge/Characterization/Profiler#Dektak XTA_new_stylus_profiler|Dektak XTA stylus profiler]] | ![[Specific Process Knowledge/Characterization/Profiler#Dektak XTA_new_stylus_profiler|Dektak XTA stylus profiler]] | ||
![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]] | ![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]] | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Generel description | !Generel description | ||
|Profiler for measuring | |Profiler for measuring microstructures. Can do wafer mapping, roughness measurements and stress measurements. | ||
|Profiler for measuring | |Profiler for measuring microstructures. Can do wafer mapping and stress measurements. | ||
|3D Profiler for measuring | |3D Profiler for measuring microstructures and surface roughness. Can do wafer mapping. | ||
|3D Profiler for measuring | |3D Profiler for measuring microstructures and surface roughness. Can do wafer mapping. Located in the basement. | ||
|AFM for measuring nanostructures and surface roughness | |AFM for measuring nanostructures and surface roughness | ||
|Profiler for measuring | |Profiler for measuring microstructures. Located in Pack Lab. | ||
|Profiler for measuring | |Profiler for measuring microstructures. Located in the basement. | ||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
!'''Max. scan range xy''' | !'''Max. scan range xy''' | ||
|Line scan x: | |Line scan x: 1 µm to 200mm | ||
|Line scan x: 50µm to 55mm in one scan. Maximum scan | |Line scan x: 50µm to 55mm in one scan. Maximum scan length with stitching 200mm. | ||
|Depending on the objective: | |Depending on the objective: | ||
*One view: 127µmX95µm to 1270µmX955µm | *One view: 127µmX95µm to 1270µmX955µm | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!'''Max. scan range z''' | !'''Max. scan range z''' | ||
| | |up to 900 µm | ||
|50 Å to 1 mm | |50 Å to 1 mm | ||
|Depending on the objective and Z resolution: | |Depending on the objective and Z resolution: | ||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
!'''Resolution xy''' | !'''Resolution xy''' | ||
|down to 0. | |down to 0.025 µm | ||
|down to 0.003 µm | |down to 0.003 µm | ||
|Depending on the objective: | |Depending on the objective: | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!'''Resolution z''' | !'''Resolution z''' | ||
| | |0.01, 0.08 or 0.6 Å depending on range (according to manufacturer) | ||
|1 Å, 10 Å, 40 Å or 160 Å depending on range | |1 Å, 10 Å, 40 Å or 160 Å depending on range | ||
|Depending on measuring methode: | |Depending on measuring methode: | ||